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  • Optical Measurement
    SEMILAB SE Series are state of the art, cost effective ellipsometers addressing semiconductor More-than-Moore, III-V (GaN, InGaAs), Micro (O)LED industry. With more than 30 years of experience in ellipsometry, SEMILAB offers an extensive application knowledge and library to support start production and long-term development.
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  • Electrical Measurement
    DLS Deep Level Transient Spectrometer provides metrology of the highest sensitivity for characterization and identification of impurities and defects (known as traps) for the wafermaker market and research institutes.
    The new technologies - a low-vibration cryostat with improved signal-to-noise ratio, a more accurate temperature controller and the improved evaluation software - allow for automatic control of the experimental parameters and automatic evaluation of trap concentration, activation energy and capture cross section on semiconductor samples.
    PRODUCT
    Semilab Parallel Dipole Line Hall Measurement System is a standalone device for measurement of sheet resistance, carrier concentration and mobility.
    PDL system uses AC and DC field Hall measurement methods with permanent magnets, fully integrated instrumentation and software for enhanced research productivity.
    Semilab PDL Hall system is capable of measuring several materials, like semiconductors, compound materials (III-V, II-VI), solar cells, transparent conductive oxides (TCOs) and organics electronics (OTFT, OLED) with very high sensitivity.
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    Semilab's COREMA system is based on a contactless capacitance technique used for precise resistivity characterization of semi-insulating compound semiconductors over a wide resistivity range, useful for the device manufacturing industry.
    Knowing the uniformity of resistivity and mobility values is critical to achieve process optimization.
    Mapping is critical for semi-insulating semiconductor QA processes as they show inhomogeneities that occur during manufacturing
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    The PMR system provides a non-contact optical method for in-line monitoring of ion implantation processes of silicon product wafers for various device process flow types in the memory, automotive or power device industries.
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