Features and System specifications:

A versatile electrical technique for characterizing depth profiles from surface through any multilayer structures of arbitrary depth

Offers high spatial and depth resolution

The technology can be used on wide range of resistivities & dopant densities

The SRP product line can be used in the following applications:

  •Resistivity and doping depth profile determination in silicon semiconductor epitaxial layers

  •Process monitoring of ion implantation

  •Real structure determination of final devices

  •Measurement on patterned samples