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EIR

Rapid non-contact and non-destructive FTIR inspection system (configured with reflection and transmission measurement option) for epitaxial thickness, dielectric composition and high dopant concentration measurement for wafer maker and IC manufacturer industry.

Features and System specifications:

Complex analysis solutoins:

  •Versatile open modelling software - free recipe creation without limitation

  •BPSG monitoring in both reflection and transmission mode

Accuracy:

  •Smaller spot size leading to lower Edge Exclusion

  •Fast X-Y stage

  •Model based measurement with improved accuracy and additional parameter monitoring     (EPI thickness, TZ, dopant)