Features and System specifications:

Implant dose:

  •Species As, B, P, BF2, In, Sb, C (application for other species under development)

Process requirements - Unannealed implanted layers, Surface oxide

Fully SEMI-compliant (300 mm) automation

Overhead transport (OHT) available

Fully compliant to Tier 1 contamination specs, including Class 1 mini-environment

Two FOUPs capable of handling wafers up to 300 mm size

State of the art software:

  •Recipe-based operation

  •Host communication

  •Different access levels

Pattern recognition option