Features and System specifications:
- A versatile electrical technique for characterizing depth profiles from surface through any multilayer structures of arbitrary depth
- Offers high spatial and depth resolution
- The technology can be used on wide range of resistivities & dopant densities
The SRP product line can be used in the following applications:
•Resistivity and doping depth profile determination in silicon semiconductor epitaxial layers
•Process monitoring of ion implantation
•Real structure determination of final devices
•Measurement on patterned samples