Features and System specifications:

-A versatile electrical technique for characterizing depth profiles from surface through any multilayer structures of arbitrary depth

-Offers high spatial and depth resolution

-The technology can be used on wide range of resistivities & dopant densities

The SRP product line can be used in the following applications:

  •Resistivity and doping depth profile determination in silicon semiconductor epitaxial layers

  •Process monitoring of ion implantation

  •Real structure determination of final devices

  •Measurement on patterned samples