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MBIR(QIR)

Semilab IR 제품군은 Model-based Infrared Reflectometry를 사용하여 나노미터 정밀도로 깎인 구조물의 두께, 깊이 및 etched, recess filled trench structures의 파라미터를 측정합니다. 또한 30 나노미터 이하에서도 옴스트롱 정밀도로 Epitaxial Layer 두께를 측정할 수 있습니다

Features and System specifications:

Product series and sample size:

IR-2100: Coupon size up to 300 mm

•IR-2200: 150/200 mm, with one open cassette or SMIF loadport

•IR-2500: 300 mm, with one FOUP loadport

•IR-3200: 200/300 mm, with two open cassette, SMIF or FOUP loadports.


Each product is available with one of the following MBIR optics:

•The large spot optics are mainly used for films or for measurements in the device area of patterned wafers.

•The small spot optics enable measurements of scribe line test structures on patterned wafers.


Cognex Patmax© pattern recognition

Camera-based autofocus

Robust glowbar/halogen source with a lifetime > 3 years


Conformity:

•EMC directive

•Low voltage directive

•SEMI standards compliant


Windows-based software with menu-driven recipe selection/generation